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Manufacturing

  • ESD - Physics and Devices

    Electrostatic discharge (ESD) phenomena have been known to mankind since Thales of Miletus in approximately 600 B.C.E. noticed the attraction of strands of hay to amber. Two thousand six hundred years have passed and the quest to obtain a better under- standing of electrostatics and ESD phenomenon continues. Today, the Manufacturing of microelectronics has continued the interest in the field of electrostatic phenomenon spanning factory issues, tooling, materials, and the microelectronic industry

    標簽: Devices Physics ESD and

    上傳時間: 2020-06-05

    上傳用戶:shancjb

  • ESD Program Management

    Electrostatic discharge  (ESD)  events  can  have serious detrimental effects  on  the manufacture  and  performance of microelectronic devices, the systems that contain them,  and  the Manufacturing facilities used  to produce them. Submicron device technologies, high system operating speeds,  and  factory automation are making  ESD  control programs a critical factor  in  the quality  and  reliability of ESD-sensitive products.

    標簽: Management Program ESD

    上傳時間: 2020-06-05

    上傳用戶:shancjb

  • ESD+Basics

    This text, ESD Basics: From Semiconductor Manufacturing to Product Use was initiated on the need to produce a text that addresses fundamentals of electrostatic discharge from the Manufacturing environment to today’s products. As the Manufacturing world evolves, semi- conductor networks scale, and systems are changing, the needs and requirements for reliabi- lity and ESD protection are changing. A text is required that connects basic ESD phenomena to today’s real world environment.

    標簽: Basics ESD

    上傳時間: 2020-06-05

    上傳用戶:shancjb

  • Chemical mechanical polishing

    The planarization technology of Chemical-Mechanical-Polishing (CMP), used for the Manufacturing of multi- level metal interconnects for high-density Integrated Circuits (IC), is also readily adaptable as an enabling technology in MicroElectroMechanical Systems (MEMS) fabrication, particularly polysilicon surface micromachining. CMP not only eases the design and manufacturability of MEMS devices by eliminating several photolithographic and film issues generated by severe topography, but also enables far greater flexibility with process complexity and associated designs. T

    標簽: mechanical polishing Chemical

    上傳時間: 2020-06-06

    上傳用戶:shancjb

  • Modern_Control_Theory

    The main aim of this book is to present a unified, systematic description of basic and advanced problems, methods and algorithms of the modern con- trol theory considered as a foundation for the design of computer control and management systems. The scope of the book differs considerably from the topics of classical traditional control theory mainly oriented to the needs of automatic control of technical devices and technological proc- esses. Taking into account a variety of new applications, the book presents a compact and uniform description containing traditional analysis and op- timization problems for control systems as well as control problems with non-probabilistic models of uncertainty, problems of learning, intelligent, knowledge-based and operation systems – important for applications in the control of Manufacturing processes, in the project management and in the control of computer systems.

    標簽: Modern_Control_Theory

    上傳時間: 2020-06-10

    上傳用戶:shancjb

  • Design for Manufacturability and Statistical

    Design for manufacturability and statistical design encompass a number of activities and areas of study spanning the integrated circuit design and Manufacturing worlds. In the early days of the planar integrated circuit, it was typical for a handful of practitioners working on a particular design to have a fairly complete understanding of the Manufacturing process, the resulting semiconductor active and passive devices, as well as the resulting circuit - often composed of as few as tens of devices. With the success of semiconductor scaling, predicted and - to a certain extent even driven - by Moore’s law, and the vastly increased complexity of modern nano-meter scale processes and the billion-device circuits they allow, there came a necessary separation between the various disciplines.

    標簽: Manufacturability Statistical Design for and

    上傳時間: 2020-06-10

    上傳用戶:shancjb

  • Fundamentals of Semiconductor Manufacturing And Process Control

    半導體生產和過程控制的基礎  這是一本系統介紹芯片生產工藝基礎的好書,敘事嚴謹,條理清晰,值得一看

    標簽: 芯片生產工藝

    上傳時間: 2021-11-03

    上傳用戶:

  • VIP專區-嵌入式/單片機編程源碼精選合集系列(133)

    VIP專區-嵌入式/單片機編程源碼精選合集系列(133)資源包含以下內容:1. 一款優秀的51系統讀寫U盤的源程序和原理圖.2. Automating Manufacturing Systems with PLCs 一本關于plc的理論書籍,解析很詳細.3. 基于ATmega128的無線通信節點程序.4. wince 串口通訊非常好的源代碼.5. Cypress 的(鼠標+鍵盤)復合設備匯編源程序.6. S3C44B0X開發板上的蜂鳴器測試程序.7. MCP2515使用的一個例子,有原理圖和原代碼.很使用..8. 步進電機的C++控制 很好用 適合初學者參考.9. 基于無線網絡zigbee的協議棧的c代碼。.10. 該文檔介紹了如何用ti的cc2420來實現zigbee無線傳感網絡。.11. NPI單片機C語言編寫的EEPROM讀寫程序,單片機為AT89C51ED2..12. IP04是一個使用Blackfin開源硬件結合Asterisk開源軟件建立的IPPBX系統..13. 西安傅立葉科技的三星ARMS3C2410開發板電路的原理圖.14. 磁盤FAT扇區數據讀寫操作 Ver 1.20(更新版).15. ATMEL 90usb128 USB CDC source,include USB protocol stack..16. (1)利用單片機定時器中斷和定時器計數方式實現秒、分定時。 (2)通過LED顯示程序的調整.17. 可實現時鐘功能,倒計時,秒表,可以修改時間,蜂鳴器報警等.18. 帶 SPI接口的獨立 以太網控制器 . 2006 Microchip Technology Inc.高級信息 DS39662A_CN.19. 本文研究了在目前流行的嵌入式微控制器ARM9(Samsung 的 S3C2410)上硬件測試的方法。分析了在嵌入式Linux基礎上開發測試程序的基本方法.20. 基于ARM2200開發平臺開發的嵌入式TCPIP協議棧.21. Nucleus集成開發環境測試版.22. 軟件無線電USRP v4.2版本硬件原理圖.23. 嵌入式usb硬件開發.24. 基于QtEmbedded的GUI移植及應用程序開發.25. 最流行的CPLD.26. verilog語言編寫的多處理器的程序代碼.27. Flash file system.28. 本設計應用AT89C52單片機對高亮度LED顯示屏進行控制.29. 最近做的工程需要用到步進電機,但由于量小,又沒有廠家的選型手冊,只得托人從深圳隨便發了幾個…… NMB (PM35L-048-HPH7)據我的測試.30. 運行ambfn7.m函數.31. 《PIC單片機應用開發典型模塊》源代碼及圖片.32. 嵌入式開發的資料.33. 這是一個在某開發板上的FLASH文件系統的源碼.34. STC12C5404AD的串口程序.35. E2ROM的讀寫程序.36. DS1302+AT89S52+LED的時鐘顯示.37. 電子時鐘芯片ds1302的c51的程序例子.38. 用AT89C51和DS1302一起做的萬年歷.39. 簡單的在ATMEGA64上移植ucosII.40. 用硬件描述語言(或混合原理圖)設計模24計數器模塊、4-7顯示譯碼模塊、頂層模塊。.

    標簽: 智能卡技術

    上傳時間: 2013-06-24

    上傳用戶:eeworm

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